Transmission properties of nanoscale aperture arrays in metallic masks on optical fibers

We report the optical studies of nanohole arrays in metallic coatings on cleaved optical fibers and also on glass substrates. Nanoholes are produced using electron-beam lithography and range in size from 100 to 700 nm; the pitch is varied from 300 to 3000 nm. Transmission properties are examined using visible (632.8 nm) and infrared (1550 nm) laser light. The observed interference patterns are determined by array symmetry, nanohole diameter, and pitch. Results from the optical fibers are compared with larger array areas fabricated on bulk glass substrates. In all cases the results are simulated using near- and intermediate-field diffraction theory with good agreement.