Toroidal ECR system for thin film deposition

W. Greig, X. Zhang, M. Baker, S. Gangopadhyay

Research output: Contribution to journalConference articlepeer-review

Abstract

A low pressure, plasma-enhanced chemical vapor deposition (PECVD) system has been built, utilizing a plasma created by electron cyclotron resonance (ECR) ionization of source gases. The magnetic mirror on the usual, cylindrical geometry ECR system has been replaced by a racetrack, or toroidal, geometry. The toroidal design is employed to yield the high electron temperatures necessary to dissociate large molecules completely and produce the necessary precursors for deposition. The toroidal design allows for greater flexibility in control of the plasma, and the use of current knowledge of toroidal plasmas. This system is designed to maintain a stable plasma at low pressure and low plasma density. The system is being characterized by magnetic field density measurements, and other plasma diagnostic techniques, including Langmuir probe measurements made on Argon plasmas. The film quality will be compared to that of films deposited in a conventional linear system under similar conditions. The system is flexible enough to run with virtually any source gas, and is presently set to run with methane for carbon films and with a proprietary liquid source for silicon carbide films.

Original languageEnglish
Pages (from-to)216
Number of pages1
JournalIEEE International Conference on Plasma Science
StatePublished - 1994
EventProceedings of the IEEE International Conference on Plasma Science - Santa Fe, NM, USA
Duration: Jun 6 1994Jun 8 1994

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