Solid-phase epitaxial regrowth and dopant activation of arsenic-implanted metastable pseudomorphic Ge0.08Si0.92 and Ge0.16Si0.84 on Si(100)

D. Y.C. Lie, J. H. Song, M. A. Nicolet, N. D. Theodore, J. Candelaria, S. G. Thomas, M. O. Tanner, K. L. Wang

Research output: Contribution to journal › Conference article › peer-review

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