SiO2/TiO2 distributed Bragg reflector near 1.5 μm fabricated by e-beam evaporation

I. Wen Feng, Sixuan Jin, Jing Li, Jingyu Lin, Hongxing Jiang

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Abstract

The authors report on the fabrication and characterization of SiO 2/TiO2 distributed Bragg reflector (DBR) mirrors operating at the eye safe and optical communication wavelength window, λ = 1.5 μm. Our experimental results demonstrated that SiO2/TiO 2 DBR mirrors with reflectivity exceeding 95% at λ = 1.5 μm can be achieved using e-beam evaporation in conjunction with postdeposition thermal annealing process in ambient air. It was found that the postdeposition annealing process transformed the crystal structure of the as-deposited Ti xOy to TiO2, leading to a significant reduction in optical absorption. Erbium doped III-nitride semiconductors incorporating DBR mirrors at 1.5 μm emission may open up many novel applications, including infrared emitters, optical amplifiers, and high power infrared lasers.

Original languageEnglish
Article number061514
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume31
Issue number6
DOIs
StatePublished - Nov 2013

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