Silicon-dioxide waveguides with low birefringence

L. Grave de Peralta, Ayrton A. Bernussi, H. Temkin, Marcus M. Borhani, David E. Doucette

Research output: Contribution to journalArticlepeer-review

25 Scopus citations


We describe the use of highly boron-doped silicon dioxide for the preparation of optical waveguides with very low birefringence. Plasma-enhanced chemical vapor deposition was used to vary the boron content from 5 wt% to 10 wt%, at a constant phosphorus content of 4.8%. A transition from compressive to tensile stress was observed at a boron concentration of 9.1%. Pedestal-type waveguides formed with the high-boron top cladding layer show low loss of 0.02 dB/cm. Arrayed waveguide grating devices with a polarization-dependent wavelength shift of 0.01 nm and excellent stability have been demonstrated.

Original languageEnglish
Pages (from-to)874-879
Number of pages6
JournalIEEE Journal of Quantum Electronics
Issue number7
StatePublished - Jul 2003


  • Glass
  • Multiplexing
  • Optical waveguides
  • Photoelasticity
  • Polarization


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