Short time optical and electrical diagnostics of pulsed N2 and SF6 discharges

M. Giesselmann, W. Pfeiffer, J. Wolf

Research output: Contribution to conferencePaperpeer-review

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Abstract

The discharge development in N2 and SF6 was investigated in the nanosecond range for impulse voltage stresses. The experiments were carried out using two cable pulse generators with 150-kV, 200-ns and 250-kV, 400-ns square-wave pulses, respectively. Measurements were made in free gas and at gas-solid interfaces. The processes in the test gap were registered with a high-speed framing camera from the predischarge regime until the formation of a highly conductive plasma channel was completed. It was found that after the formative time lag, impulse breakdown in SF6 was initiated by a steep partial voltage drop followed by an intermediate stage of slow voltage drop. In the presence of an insulator surface no intermediate stage was observed, and the voltage drop completed in a few nanoseconds.

Original languageEnglish
Pages182-186
Number of pages5
StatePublished - 1987
EventSixth IEEE Pulsed Power Conference - Digest of Technical Papers - Arlington, VA, USA
Duration: Jun 29 1987Jul 1 1987

Conference

ConferenceSixth IEEE Pulsed Power Conference - Digest of Technical Papers
CityArlington, VA, USA
Period06/29/8707/1/87

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