Resistless nanoimprinting in metal for plasmonic nanostructures

Leo T. Varghese, Li Fan, Yi Xuan, Chookiat Tansarawiput, Sangsik Kim, Minghao Qi

Research output: Contribution to journalArticlepeer-review

24 Scopus citations

Abstract

Metal nanostructures are the main building blocks of metamaterials and plasmonics which show many extraordinary properties not existing in nature. A simple and widely applicable method that can directly pattern metals with silicon molds without the need of resists, using pressures of <4 MPa and temperatures of 25-150 °C is reported. Three-dimensional structures with smooth and vertical sidewalls, down to sub-10 nm resolution, are generated in silver and gold films in a single patterning step. Using this nanopatterning scheme, large-scale vivid images through extraordinary optical transmission and strong surface-enhanced Raman scattering substrates are realized. Resistless nanoimprinting in metal (RNIM) is a new class of metal patterning that allows plasmonic nanostructures to be fabricated quickly, repeatedly, and at a low-cost.

Original languageEnglish
Pages (from-to)3778-3783
Number of pages6
JournalSmall
Volume9
Issue number22
DOIs
StatePublished - Nov 25 2013

Keywords

  • extraordinary optical transmission
  • metal patterning
  • nanoimprint lithography
  • plasmonics
  • surface enhanced Raman scattering

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