Rapid Bimolecular and Defect-Assisted Carrier Recombination in Hexagonal Boron Nitride

Ioannis Chatzakis, Roderick B. Davidson, Adam D. Dunkelberger, Song Liu, Jaime Freitas, James Culbertson, J. H. Edgar, Daniel C. Ratchford, Chase T. Ellis, Andrea B. Grafton, Alexander J. Giles, Joseph G. Tischler, Joshua D. Caldwell, Jeffrey C. Owrutsky

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

Hexagonal boron nitride (hBN) is a wide, indirect bandgap semiconductor that holds great promise for optoelectronic devices in the ultraviolet and mid-infrared spectral regimes. The efficiency of optoelectronic devices is dominated by the dynamic behavior of photogenerated carriers. Here we report on the dynamics of photoexcited free carriers in exfoliated 10B-enriched (99%) hBN at room temperature. Through implementation of ultrafast ultraviolet-pump-infrared-probe transient transmission spectroscopy, we identify two characteristic recombination rates. Initially, at high free carrier density, the pump fluence dependence is bimolecular with a characteristic rate constant of a2.0 × 10-7 cm3/s. This is followed by an exponential recombination of the free carriers at a rate of a2.3 × 109 s-1, which we assign to the influence of the impurities and defects in the lattice. These initial results offer insight into the radiative recombination processes for deep ultraviolet optoelectronic devices and toward realizing active control of mid-IR nanophotonic responses.

Original languageEnglish
Pages (from-to)14689-14695
Number of pages7
JournalJournal of Physical Chemistry C
Volume123
Issue number23
DOIs
StatePublished - Jun 13 2019

Fingerprint

Dive into the research topics of 'Rapid Bimolecular and Defect-Assisted Carrier Recombination in Hexagonal Boron Nitride'. Together they form a unique fingerprint.

Cite this