Pulsed microdischarge, 121.6 nm VUV source with 40 watt peak power

J. Stephens; A. Fierro; J. Dickens; A. Neuber

doi:10.1109/PLASMA.2014.7012344

Pulsed microdischarge, 121.6 nm VUV source with 40 watt peak power

J. Stephens, A. Fierro, J. Dickens, A. Neuber

Electrical and Computer Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Original language	English
Title of host publication	ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9781479927111
DOIs	https://doi.org/10.1109/PLASMA.2014.7012344
State	Published - Jan 16 2015
Event	41st IEEE International Conference on Plasma Science, ICOPS 2014 and the 20th IEEE International Conference on High-Power Particle Beams, BEAMS 2014 - Washington, United States Duration: May 25 2014 → May 29 2014

Publication series

Name	ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams

Conference

Conference	41st IEEE International Conference on Plasma Science, ICOPS 2014 and the 20th IEEE International Conference on High-Power Particle Beams, BEAMS 2014
Country	United States
City	Washington
Period	05/25/14 → 05/29/14

Access to Document

10.1109/PLASMA.2014.7012344

Cite this

Stephens, J., Fierro, A., Dickens, J., & Neuber, A. (2015). Pulsed microdischarge, 121.6 nm VUV source with 40 watt peak power. In ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams [7012344] (ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PLASMA.2014.7012344

Stephens, J. ; Fierro, A. ; Dickens, J. ; Neuber, A. / Pulsed microdischarge, 121.6 nm VUV source with 40 watt peak power. ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams. Institute of Electrical and Electronics Engineers Inc., 2015. (ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams).

@inproceedings{1909f183b09e4740bfd6f558cfc58002,

title = "Pulsed microdischarge, 121.6 nm VUV source with 40 watt peak power",

author = "J. Stephens and A. Fierro and J. Dickens and A. Neuber",

year = "2015",

month = jan,

day = "16",

doi = "10.1109/PLASMA.2014.7012344",

language = "English",

series = "ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

booktitle = "ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams",

note = "null ; Conference date: 25-05-2014 Through 29-05-2014",

}

Stephens, J, Fierro, A, Dickens, J & Neuber, A 2015, Pulsed microdischarge, 121.6 nm VUV source with 40 watt peak power. in ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams., 7012344, ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams, Institute of Electrical and Electronics Engineers Inc., 41st IEEE International Conference on Plasma Science, ICOPS 2014 and the 20th IEEE International Conference on High-Power Particle Beams, BEAMS 2014, Washington, United States, 05/25/14. https://doi.org/10.1109/PLASMA.2014.7012344

Pulsed microdischarge, 121.6 nm VUV source with 40 watt peak power. / Stephens, J.; Fierro, A.; Dickens, J.; Neuber, A.

ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams. Institute of Electrical and Electronics Engineers Inc., 2015. 7012344 (ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Pulsed microdischarge, 121.6 nm VUV source with 40 watt peak power

AU - Stephens, J.

AU - Fierro, A.

AU - Dickens, J.

AU - Neuber, A.

PY - 2015/1/16

Y1 - 2015/1/16

UR - http://www.scopus.com/inward/record.url?scp=84923005229&partnerID=8YFLogxK

U2 - 10.1109/PLASMA.2014.7012344

DO - 10.1109/PLASMA.2014.7012344

M3 - Conference contribution

T3 - ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams

BT - ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams

PB - Institute of Electrical and Electronics Engineers Inc.

Y2 - 25 May 2014 through 29 May 2014

ER -

Stephens J, Fierro A, Dickens J , Neuber A. Pulsed microdischarge, 121.6 nm VUV source with 40 watt peak power. In ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams. Institute of Electrical and Electronics Engineers Inc. 2015. 7012344. (ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams). https://doi.org/10.1109/PLASMA.2014.7012344

Pulsed microdischarge, 121.6 nm VUV source with 40 watt peak power

Publication series

Conference

Access to Document

Other files and links

Cite this