Preparation and microstructural characterization of oriented titanosilicate ETS-10 thin films on indium tin oxide surfaces

Oriented polycrystalline ETS-10 thin films (average thickness ∼1.50-1.75 μm) were prepared on the ITO glass substrates using secondary growth of ETS-10 multilayers with a partial a(b)-out-of-plane preferred crystal orientation. After secondary growth, the films showed a columnar grain microstructure, and a significantly increased degree of a(b)-out-of-plane orientation. This orientation is desirable for advanced applications of ETS-10 films. The prepared films were strongly attached to the ITO glass substrates as evidenced by the absence of discernible differences in the substrate coverage with film after a 60-min ultrasonication in water.