Original language | English |
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Pages (from-to) | 1300 – 5 |
Journal | J. Electron. Mat. |
State | Published - Mar 2015 |
Plasma etching of n-type 4H-SiC for the photoconductive semiconductor switch applications
Huseyin Ekinci, Kurt Caswell, Daniel L Mauch, James Dickens, Sergey Nikishin
Research output: Contribution to journal › Article › peer-review