Abstract
The first report of the in situ capture of the SO 2 fragment of the trifluoromethylsulfonyl radical is described here. With cyclobutanone oximes as representative alkyl radical precursors, vinyl triflates and allyl trifluoromethylsulfones were employed as radical acceptors and SO 2 sources to provide various β-ketosulfones and allylsulfones, known to be significant building blocks. Without the use of any additives including external SO 2 gas, the reaction was performed under mild photoredox- or metal-catalytic conditions while tolerating various functional groups.
Original language | English |
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Pages (from-to) | 1216-1220 |
Number of pages | 5 |
Journal | Organic Letters |
Volume | 21 |
Issue number | 4 |
DOIs | |
State | Published - Feb 15 2019 |