TY - JOUR
T1 - Optimizing drive parameters of a nanosecond, repetitively pulsed microdischarge high power 121.6nm source
AU - Stephens, J.
AU - Fierro, A.
AU - Trienekens, D.
AU - Dickens, J.
AU - Neuber, A.
N1 - Publisher Copyright:
© 2015 IOP Publishing Ltd.
PY - 2015/2/1
Y1 - 2015/2/1
N2 - Utilizing nanosecond high voltage pulses to drive microdischarges (MDs) at repetition rates in the vicinity of 1MHz previously enabled increased time-averaged power deposition, peak vacuum ultraviolet (VUV) power yield, as well as time-averaged VUV power yield. Here, various pulse widths (30-250ns), and pulse repetition rates (100kHz-5MHz) are utilized, and the resulting VUV yield is reported. It was observed that the use of a 50ns pulse width, at a repetition rate of 100kHz, provided 62W peak VUV power and 310mW time-averaged VUV power, with a time-averaged VUV generation efficiency of ∼1.1%. Optimization of the driving parameters resulted in 1-2 orders of magnitude increase in peak and time-averaged power when compared to low power, dc-driven MDs.
AB - Utilizing nanosecond high voltage pulses to drive microdischarges (MDs) at repetition rates in the vicinity of 1MHz previously enabled increased time-averaged power deposition, peak vacuum ultraviolet (VUV) power yield, as well as time-averaged VUV power yield. Here, various pulse widths (30-250ns), and pulse repetition rates (100kHz-5MHz) are utilized, and the resulting VUV yield is reported. It was observed that the use of a 50ns pulse width, at a repetition rate of 100kHz, provided 62W peak VUV power and 310mW time-averaged VUV power, with a time-averaged VUV generation efficiency of ∼1.1%. Optimization of the driving parameters resulted in 1-2 orders of magnitude increase in peak and time-averaged power when compared to low power, dc-driven MDs.
KW - gas discharge
KW - microdischarge
KW - pulsed discharge
KW - vacuum ultraviolet
UR - http://www.scopus.com/inward/record.url?scp=84921816918&partnerID=8YFLogxK
U2 - 10.1088/0963-0252/24/1/015013
DO - 10.1088/0963-0252/24/1/015013
M3 - Article
AN - SCOPUS:84921816918
SN - 0963-0252
VL - 24
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
IS - 1
M1 - 015013
ER -