Optimizing drive parameters of a nanosecond, repetitively pulsed microdischarge high power 121.6nm source

J. Stephens, A. Fierro, D. Trienekens, J. Dickens, A. Neuber

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

Utilizing nanosecond high voltage pulses to drive microdischarges (MDs) at repetition rates in the vicinity of 1MHz previously enabled increased time-averaged power deposition, peak vacuum ultraviolet (VUV) power yield, as well as time-averaged VUV power yield. Here, various pulse widths (30-250ns), and pulse repetition rates (100kHz-5MHz) are utilized, and the resulting VUV yield is reported. It was observed that the use of a 50ns pulse width, at a repetition rate of 100kHz, provided 62W peak VUV power and 310mW time-averaged VUV power, with a time-averaged VUV generation efficiency of ∼1.1%. Optimization of the driving parameters resulted in 1-2 orders of magnitude increase in peak and time-averaged power when compared to low power, dc-driven MDs.

Original languageEnglish
Article number015013
JournalPlasma Sources Science and Technology
Volume24
Issue number1
DOIs
StatePublished - Feb 1 2015

Keywords

  • gas discharge
  • microdischarge
  • pulsed discharge
  • vacuum ultraviolet

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