TY - JOUR
T1 - Material and energy efficiency analysis of low pressure chemical vapour deposition of TiO2 film
AU - Wang, Fenfen
AU - Zhu, Nanjing
AU - Li, Tao
AU - Zhang, Hong Chao
N1 - Funding Information:
The authors would like to thank the financial support from National Natural Science Foundation of China (51205042).
PY - 2014
Y1 - 2014
N2 - In this paper, Low Pressure Chemical Vapor Deposition (LPCVD) of TiO 2 thin film process is chosen as the research object to study the material and energy consumptions in this process. The material and energy utilization efficiencies have been calculated and compared under five different reaction conditions (623K, 500Pa; 673K, 500Pa; 723K, 500Pa; 673K, 400Pa; 673K, 300Pa). The material utilization efficiency result reveals that the material utilization in this process is rather low (less 1% in each condition) and increases with higher temperature and lower pressure. The energy analysis result shows that the energy efficiency is extremely low (less 0.1% in each condition) and increases with decreasing temperature and increasing pressure. The reaction condition (623K, 500Pa) is regarded as a satisfactory condition with the highest energy efficiency (0.083%) in spite of the lowest material utilization efficiency (0.5%). This research can lay a foundation for the future optimization work to improve the sustainability performance of LPCVD preparing thin films.
AB - In this paper, Low Pressure Chemical Vapor Deposition (LPCVD) of TiO 2 thin film process is chosen as the research object to study the material and energy consumptions in this process. The material and energy utilization efficiencies have been calculated and compared under five different reaction conditions (623K, 500Pa; 673K, 500Pa; 723K, 500Pa; 673K, 400Pa; 673K, 300Pa). The material utilization efficiency result reveals that the material utilization in this process is rather low (less 1% in each condition) and increases with higher temperature and lower pressure. The energy analysis result shows that the energy efficiency is extremely low (less 0.1% in each condition) and increases with decreasing temperature and increasing pressure. The reaction condition (623K, 500Pa) is regarded as a satisfactory condition with the highest energy efficiency (0.083%) in spite of the lowest material utilization efficiency (0.5%). This research can lay a foundation for the future optimization work to improve the sustainability performance of LPCVD preparing thin films.
KW - Energy consumption
KW - Energy efficiency
KW - Low pressure chemical vapor deposition (LPCVD)
KW - Material consumption
KW - Material utilization
UR - http://www.scopus.com/inward/record.url?scp=84903600833&partnerID=8YFLogxK
U2 - 10.1016/j.procir.2014.06.044
DO - 10.1016/j.procir.2014.06.044
M3 - Article
AN - SCOPUS:84903600833
SN - 2212-8271
VL - 15
SP - 32
EP - 37
JO - Procedia CIRP
JF - Procedia CIRP
ER -