In this paper, Low Pressure Chemical Vapor Deposition (LPCVD) of TiO 2 thin film process is chosen as the research object to study the material and energy consumptions in this process. The material and energy utilization efficiencies have been calculated and compared under five different reaction conditions (623K, 500Pa; 673K, 500Pa; 723K, 500Pa; 673K, 400Pa; 673K, 300Pa). The material utilization efficiency result reveals that the material utilization in this process is rather low (less 1% in each condition) and increases with higher temperature and lower pressure. The energy analysis result shows that the energy efficiency is extremely low (less 0.1% in each condition) and increases with decreasing temperature and increasing pressure. The reaction condition (623K, 500Pa) is regarded as a satisfactory condition with the highest energy efficiency (0.083%) in spite of the lowest material utilization efficiency (0.5%). This research can lay a foundation for the future optimization work to improve the sustainability performance of LPCVD preparing thin films.
- Energy consumption
- Energy efficiency
- Low pressure chemical vapor deposition (LPCVD)
- Material consumption
- Material utilization