Investigation on hexamethyldisilazane vapor treatment of plasma-damaged nanoporous organosilicate films

T. Rajagopalan, B. Lahlouh, J. A. Lubguban, N. Biswas, S. Gangopadhyay, J. Sun, D. H. Huang, S. L. Simon, D. Toma, R. Butler

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29 Scopus citations


Hexamethyldisilazane (HMDS) vapor treatment of plasma-damaged nanoporous organosilicate thin films has been studied as a function of treatment temperature in this work. Although, the HMDS vapor treatment facilitated incorporation of methyl (CH 3 ) groups subsequent to the removal of free hydroxyl (OH) groups in the damaged films at treatment temperature as low as 55 °C, the bonded OH groups were not removed. More significantly, detailed analysis of the results reveals that HMDS vapor modified only the surface of the plasma-damaged samples and not the entire film as expected. This is attributed to the formation of a thin solid layer on the surface, which effectively prevents penetration of HMDS vapors into the bulk. The Fourier transform-infrared (FT-IR) absorption and dielectric constant measurements confirm that the vapor treatment assists only partial curing of the plasma-damaged films. Alternative processes of curing the films with HMDS dissolved in supercritical carbon dioxide (SCCO 2 ) as a medium of reaction in static and pulsed modes were also attempted and the results are presented in this paper.

Original languageEnglish
Pages (from-to)6323-6331
Number of pages9
JournalApplied Surface Science
Issue number18
StatePublished - Jul 15 2006


  • Low-k
  • Plasma-damage
  • Porous films
  • Supercritical CO


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