Influence of RF plasma power on structural properties of AlN thin layers grown on Si (111) by plasma-assisted molecular beam epitaxy

Oleg Ledyaev, Mahesh Pandikunta, Sergey Nikishin

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)050306
JournalJpn. J Appl. Phys.
StatePublished - 2014

    Fingerprint

Cite this