| Original language | English |
|---|---|
| Pages (from-to) | 050306 |
| Journal | Jpn. J Appl. Phys. |
| State | Published - 2014 |
Influence of RF plasma power on structural properties of AlN thin layers grown on Si (111) by plasma-assisted molecular beam epitaxy
Oleg Ledyaev, Mahesh Pandikunta, Sergey Nikishin
Research output: Contribution to journal › Article › peer-review