Abstract
We report on the low pressure metal organic chemical vapor deposition of single crystal, wurtzitic layers of GaN and GaN/InGaN heterostructures on (111) GaAs/Si composite substrates. The structural, optical, and electrical properties of the epitaxial layers are evaluated using x-ray diffraction, transmission electron microscopy, photoluminescence, and measurements of minority carrier diffusion length. These measurements demonstrate high quality of GaN grown on the composite substrate.
Original language | English |
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Pages (from-to) | 3566-3568 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 69 |
Issue number | 23 |
DOIs | |
State | Published - Dec 2 1996 |