High quality GaN-InGaN heterostructures grown on (111) silicon substrates

J. W. Yang, C. J. Sun, Q. Chen, M. Z. Anwar, M. Asif Khan, S. A. Nikishin, G. A. Seryogin, A. V. Osinsky, L. Chernyak, H. Temkin, Chimin Hu, S. Mahajan

Research output: Contribution to journalArticlepeer-review

116 Scopus citations

Abstract

We report on the low pressure metal organic chemical vapor deposition of single crystal, wurtzitic layers of GaN and GaN/InGaN heterostructures on (111) GaAs/Si composite substrates. The structural, optical, and electrical properties of the epitaxial layers are evaluated using x-ray diffraction, transmission electron microscopy, photoluminescence, and measurements of minority carrier diffusion length. These measurements demonstrate high quality of GaN grown on the composite substrate.

Original languageEnglish
Pages (from-to)3566-3568
Number of pages3
JournalApplied Physics Letters
Volume69
Issue number23
DOIs
StatePublished - Dec 2 1996

Fingerprint

Dive into the research topics of 'High quality GaN-InGaN heterostructures grown on (111) silicon substrates'. Together they form a unique fingerprint.

Cite this