Fabrication and investigation of AlGaN-based Schottky barrier diode

Qing Hui Shao, Zhi Zhen Ye, Jing Yun Huang, Bing Hui Zhao, Hong Xing Jiang, Jing Yu Lin

Research output: Contribution to journalArticlepeer-review

Abstract

The AlGaN-based Schottky barrier diode was fabricated using electron beam deposited Au and Ti/Al as the Schottky contact and ohmic contact respectively for high power and high temperature applications such as microwave mixers and rectifiers. And the AlGaN/GaN/sapphire was grown by metal organic chemical vapor deposition (MOCVD). Measurements of the I-V characteristics of the diode show that the device has good rectifying property, high breakdown voltage of 95 V and ideal factor with value of 1.93. The forward and reverse current characteristics were improved greatly after annealing at 300°C for 1 min. The barrier height of the Au/AlGaN Schottky contact was as high as 1.08 eV by analysis of various I-V curves under corresponding temperatures. The results show that the device can be used in high power and large current rectification.

Original languageEnglish
Pages (from-to)1244-1247
Number of pages4
JournalZhejiang Daxue Xuebao (Gongxue Ban)/Journal of Zhejiang University (Engineering Science)
Volume38
Issue number10
StatePublished - Oct 2004

Keywords

  • AlGaN
  • Barrier height
  • Schottkty barrier diode

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