Original language | English |
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Pages (from-to) | 68--75 |
Journal | IEEE Transactions on Plasma Science |
State | Published - 2017 |
Electrothermal Simulation-Based Comparison of 4H-SiC pin, Schottky, and JBS Diodes Under High Current Density Pulsed Operation
Bejoy N Pushpakaran, Stephen Bayne, Aderinto A Ogunniyi
Research output: Contribution to journal › Article