Effect of BCl3 in chlorine-based plasma on etching 4H-SiC for photoconductive semiconductor switch applications

Huseyin Ekinci, Vladimir V Kuryatkov, Daniel L Mauch, James Dickens, Sergey Nikishin

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)051205
JournalJ. Vac. Sci. Technol. B
StatePublished - 2014

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