Effect of BCl3 in chlorine-based plasma on etching 4H-SiC for photoconductive semiconductor switch applications

Huseyin Ekinci, Vladimir V Kuryatkov, Daniel L Mauch, James Dickens, Sergey Nikishin

Research output: Contribution to journal › Article › peer-review

Cite this

@article{5cdec780eda24a1c873e5aa8c2d08170,

title = "Effect of BCl3 in chlorine-based plasma on etching 4H-SiC for photoconductive semiconductor switch applications",

author = "Huseyin Ekinci and Kuryatkov, {Vladimir V} and Mauch, {Daniel L} and James Dickens and Sergey Nikishin",

year = "2014",

language = "English",

pages = "051205",

journal = "J. Vac. Sci. Technol. B",

}