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Dopant activation and epitaxial regrowth in P-implanted pseudomorphic Ge0.12Si0.88 layers on Si(100)
D. Y.C. Lie, N. D. Theodore, F. Eisen, M. A. Nicolet, K. L. Wang
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
8
Scopus
citations