CO2-laser-enhanced electron attachment in externally sustained diffuse gas discharges containing vinyl chloride

G. Schaefer; M. Giesselmann; B. Pashaie; M. Kristiansen

doi:10.1063/1.342114

CO₂-laser-enhanced electron attachment in externally sustained diffuse gas discharges containing vinyl chloride

G. Schaefer, M. Giesselmann, B. Pashaie, M. Kristiansen

Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

Photon-enhanced attachment can be used as a conduction-control mechanism for diffuse discharge opening switches. This paper presents experimental results on photon-enhanced attachment based on vibrational excitation of vinyl chloride using a line-tunable CO₂ laser. Strong resistance increases and discharge turnoff have been observed in low-current, externally sustained dc discharges. The influence of experimental parameters such as discharge pressure, attacher concentration, discharge voltage, and laser wavelength are presented.

Original language	English
Pages (from-to)	6123-6127
Number of pages	5
Journal	Journal of Applied Physics
Volume	64
Issue number	11
DOIs	https://doi.org/10.1063/1.342114
State	Published - 1988

Access to Document

10.1063/1.342114

Cite this

@article{e2bd6c0f614645cc9e8fbbe69600d076,

title = "CO2-laser-enhanced electron attachment in externally sustained diffuse gas discharges containing vinyl chloride",

abstract = "Photon-enhanced attachment can be used as a conduction-control mechanism for diffuse discharge opening switches. This paper presents experimental results on photon-enhanced attachment based on vibrational excitation of vinyl chloride using a line-tunable CO2 laser. Strong resistance increases and discharge turnoff have been observed in low-current, externally sustained dc discharges. The influence of experimental parameters such as discharge pressure, attacher concentration, discharge voltage, and laser wavelength are presented.",

author = "G. Schaefer and M. Giesselmann and B. Pashaie and M. Kristiansen",

year = "1988",

doi = "10.1063/1.342114",

language = "English",

volume = "64",

pages = "6123--6127",

journal = "Journal of Applied Physics",

issn = "0021-8979",

number = "11",

}

TY - JOUR

T1 - CO2-laser-enhanced electron attachment in externally sustained diffuse gas discharges containing vinyl chloride

AU - Schaefer, G.

AU - Giesselmann, M.

AU - Pashaie, B.

AU - Kristiansen, M.

PY - 1988

Y1 - 1988

N2 - Photon-enhanced attachment can be used as a conduction-control mechanism for diffuse discharge opening switches. This paper presents experimental results on photon-enhanced attachment based on vibrational excitation of vinyl chloride using a line-tunable CO2 laser. Strong resistance increases and discharge turnoff have been observed in low-current, externally sustained dc discharges. The influence of experimental parameters such as discharge pressure, attacher concentration, discharge voltage, and laser wavelength are presented.

AB - Photon-enhanced attachment can be used as a conduction-control mechanism for diffuse discharge opening switches. This paper presents experimental results on photon-enhanced attachment based on vibrational excitation of vinyl chloride using a line-tunable CO2 laser. Strong resistance increases and discharge turnoff have been observed in low-current, externally sustained dc discharges. The influence of experimental parameters such as discharge pressure, attacher concentration, discharge voltage, and laser wavelength are presented.

UR - http://www.scopus.com/inward/record.url?scp=33745472824&partnerID=8YFLogxK

U2 - 10.1063/1.342114

DO - 10.1063/1.342114

M3 - Article

AN - SCOPUS:33745472824

SN - 0021-8979

VL - 64

SP - 6123

EP - 6127

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 11

ER -

CO₂-laser-enhanced electron attachment in externally sustained diffuse gas discharges containing vinyl chloride

Abstract

Access to Document

Other files and links

Fingerprint

Cite this