Chemical and optical characterisation of atomic layer deposition aluminium doped ZnO films for photovoltaics by glow discharge optical emission spectrometry

S. W. Schmitt, G. Gamez, V. Sivakov, M. Schubert, S. H. Christiansen, J. Michler

Research output: Contribution to journalArticle

16 Scopus citations

Abstract

Aluminium doped ZnO (AZO) alloy films produced by atomic layer deposition (ALD) are analysed by glow discharge optical emission spectrometry (GD-OES). A measurement procedure is established, to determine simultaneously thickness, mean chemical composition and refractive index of homogeneous films using GD-OES and profilometry measurements. The GD-OES measured Al contents of the AZO films lie below those expected for the realised ALD cycles. Determined refractive indices are of the same accuracy as ellipsometry measurements and are dependent on the film composition as well as on the wavelength of the spectral lines used for analysis. The findings support the use of GD-OES as an analysis technique in the development of photovoltaic thin films.

Original languageEnglish
Pages (from-to)822-827
Number of pages6
JournalJournal of analytical atomic spectrometry
Volume26
Issue number4
DOIs
StatePublished - Apr 2011

Fingerprint Dive into the research topics of 'Chemical and optical characterisation of atomic layer deposition aluminium doped ZnO films for photovoltaics by glow discharge optical emission spectrometry'. Together they form a unique fingerprint.

Cite this