Characterization of Si3N4/Si(111) thin films by reflectance difference spectroscopy

Luis-Felipe 1. Lastras-Martinez; Nicolás Antonio Ulloa-Castillo; Rafael Herrera-Jasso; Raúl Eduardo Balderas-Navarro; Alfonso Lastras-Martínez; Mahesh Pandikunta; Oleg Ledyaev; Vladimir V Kuryatkov; Sergey Nikishin

Characterization of Si3N4/Si(111) thin films by reflectance difference spectroscopy

Luis-Felipe 1. Lastras-Martinez, Nicolás Antonio Ulloa-Castillo, Rafael Herrera-Jasso, Raúl Eduardo Balderas-Navarro, Alfonso Lastras-Martínez, Mahesh Pandikunta, Oleg Ledyaev, Vladimir V Kuryatkov, Sergey Nikishin

Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	021501
Journal	Jpn. J Appl. Phys.
State	Published - Jan 2015

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title = "Characterization of Si3N4/Si(111) thin films by reflectance difference spectroscopy",

author = "Lastras-Martinez, {Luis-Felipe 1.} and Ulloa-Castillo, {Nicol{\'a}s Antonio} and Rafael Herrera-Jasso and Balderas-Navarro, {Ra{\'u}l Eduardo} and Alfonso Lastras-Mart{\'i}nez and Mahesh Pandikunta and Oleg Ledyaev and Kuryatkov, {Vladimir V} and Sergey Nikishin",

year = "2015",

month = jan,

language = "English",

pages = "021501",

journal = "Jpn. J Appl. Phys.",

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TY - JOUR

T1 - Characterization of Si3N4/Si(111) thin films by reflectance difference spectroscopy

AU - Lastras-Martinez, Luis-Felipe 1.

AU - Ulloa-Castillo, Nicolás Antonio

AU - Herrera-Jasso, Rafael

AU - Balderas-Navarro, Raúl Eduardo

AU - Lastras-Martínez, Alfonso

AU - Pandikunta, Mahesh

AU - Ledyaev, Oleg

AU - Kuryatkov, Vladimir V

AU - Nikishin, Sergey

PY - 2015/1

Y1 - 2015/1

M3 - Article

SP - 021501

JO - Jpn. J Appl. Phys.

JF - Jpn. J Appl. Phys.

ER -

Characterization of Si3N4/Si(111) thin films by reflectance difference spectroscopy

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