A simple method for the removal of thiols on gold surfaces using an NH 4OH-H2O2-H2O solution

Jung Kim Dae; Rajasekar Pitchimani; David E. Snow; Louisa J. Hope-Weeks

doi:10.1002/sca.20089

A simple method for the removal of thiols on gold surfaces using an NH ₄OH-H₂O₂-H₂O solution

Jung Kim Dae, Rajasekar Pitchimani, David E. Snow, Louisa J. Hope-Weeks

Chemistry and Biochemistry

Research output: Contribution to journal › Article › peer-review

26 Scopus citations

Abstract

The removal behavior of self-assembled monolayers (SAMs) of thiol molecules on a gold substrate by an NH₄OH-H₂O₂-H ₂O solution was studied using attenuated total reflectance infrared spectroscopy (ATR-IR) and atomic force microscopy (AFM). Furthermore, the impact of the concentration of NH₄OH and H₂O₂ in the solution and reaction temperature on the SAM removal rate and efficiency was explored. The SAM removal rate and efficiency were significantly influenced by the concentration of NH₄OH rather than H₂O₂. The solution containing the 2; 1 molar ratio of NH₄OH:H ₂O₂ among three different solutions showed the highest removal rate and efficiency in the removal of 11-mercapto-1-undecanol, The increase in the reaction temperature resulted in the enhancement on the SAM removal rate, but it led to the fast delamination of the gold layer. These results may be useful in the regeneration of sensor surfaces relying on gold/thiol chemistry.

Original language	English
Pages (from-to)	118-122
Number of pages	5
Journal	Scanning
Volume	30
Issue number	2
DOIs	https://doi.org/10.1002/sca.20089
State	Published - Mar 2008

Keywords

11-mercapto-1-undecanol
HO
NHOH
Removal
Self-assembled monolayer

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10.1002/sca.20089

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title = "A simple method for the removal of thiols on gold surfaces using an NH 4OH-H2O2-H2O solution",

abstract = "The removal behavior of self-assembled monolayers (SAMs) of thiol molecules on a gold substrate by an NH4OH-H2O2-H 2O solution was studied using attenuated total reflectance infrared spectroscopy (ATR-IR) and atomic force microscopy (AFM). Furthermore, the impact of the concentration of NH4OH and H2O2 in the solution and reaction temperature on the SAM removal rate and efficiency was explored. The SAM removal rate and efficiency were significantly influenced by the concentration of NH4OH rather than H2O2. The solution containing the 2; 1 molar ratio of NH4OH:H 2O2 among three different solutions showed the highest removal rate and efficiency in the removal of 11-mercapto-1-undecanol, The increase in the reaction temperature resulted in the enhancement on the SAM removal rate, but it led to the fast delamination of the gold layer. These results may be useful in the regeneration of sensor surfaces relying on gold/thiol chemistry.",

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author = "Dae, {Jung Kim} and Rajasekar Pitchimani and Snow, {David E.} and Hope-Weeks, {Louisa J.}",

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AU - Pitchimani, Rajasekar

AU - Snow, David E.

AU - Hope-Weeks, Louisa J.

PY - 2008/3

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N2 - The removal behavior of self-assembled monolayers (SAMs) of thiol molecules on a gold substrate by an NH4OH-H2O2-H 2O solution was studied using attenuated total reflectance infrared spectroscopy (ATR-IR) and atomic force microscopy (AFM). Furthermore, the impact of the concentration of NH4OH and H2O2 in the solution and reaction temperature on the SAM removal rate and efficiency was explored. The SAM removal rate and efficiency were significantly influenced by the concentration of NH4OH rather than H2O2. The solution containing the 2; 1 molar ratio of NH4OH:H 2O2 among three different solutions showed the highest removal rate and efficiency in the removal of 11-mercapto-1-undecanol, The increase in the reaction temperature resulted in the enhancement on the SAM removal rate, but it led to the fast delamination of the gold layer. These results may be useful in the regeneration of sensor surfaces relying on gold/thiol chemistry.

AB - The removal behavior of self-assembled monolayers (SAMs) of thiol molecules on a gold substrate by an NH4OH-H2O2-H 2O solution was studied using attenuated total reflectance infrared spectroscopy (ATR-IR) and atomic force microscopy (AFM). Furthermore, the impact of the concentration of NH4OH and H2O2 in the solution and reaction temperature on the SAM removal rate and efficiency was explored. The SAM removal rate and efficiency were significantly influenced by the concentration of NH4OH rather than H2O2. The solution containing the 2; 1 molar ratio of NH4OH:H 2O2 among three different solutions showed the highest removal rate and efficiency in the removal of 11-mercapto-1-undecanol, The increase in the reaction temperature resulted in the enhancement on the SAM removal rate, but it led to the fast delamination of the gold layer. These results may be useful in the regeneration of sensor surfaces relying on gold/thiol chemistry.

KW - 11-mercapto-1-undecanol

KW - HO

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KW - Self-assembled monolayer

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ER -

A simple method for the removal of thiols on gold surfaces using an NH ₄OH-H₂O₂-H₂O solution

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Keywords

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