The removal behavior of self-assembled monolayers (SAMs) of thiol molecules on a gold substrate by an NH4OH-H2O2-H 2O solution was studied using attenuated total reflectance infrared spectroscopy (ATR-IR) and atomic force microscopy (AFM). Furthermore, the impact of the concentration of NH4OH and H2O2 in the solution and reaction temperature on the SAM removal rate and efficiency was explored. The SAM removal rate and efficiency were significantly influenced by the concentration of NH4OH rather than H2O2. The solution containing the 2; 1 molar ratio of NH4OH:H 2O2 among three different solutions showed the highest removal rate and efficiency in the removal of 11-mercapto-1-undecanol, The increase in the reaction temperature resulted in the enhancement on the SAM removal rate, but it led to the fast delamination of the gold layer. These results may be useful in the regeneration of sensor surfaces relying on gold/thiol chemistry.
- Self-assembled monolayer