550-W Ultraviolet exciplex source for pulsed power applications

S. Feathers, J. Stephens, A. Neuber

Research output: Contribution to journalArticle

Abstract

The investigation of a high output power, arc lamp exciplex ultraviolet (UV) source for pulsed power applications is presented. The arc lamp generates up to 550 W from XeF exciplex radiation at 351 nm, totaling to nearly 0.15-mJ total radiated UV energy over the duration of the UV pulse. With an ellipsoidal reflector, the arc lamp produces 400 W/cm2 and up to 0.1 mJ of UV light onto a 1-cm2 area. A complete experimental investigation of the arc lamp for both XeCl (308 nm) and XeF (351 nm) exciplex sources operated under varying excitation and pressure conditions is reported. As an application, the arc lamp is successfully utilized as an illumination source for an intrinsically triggered, wide bandgap SiC photoconductive semiconductor switch (PCSS), where a PCSS ON-state resistance of $500~\Omega $ is achieved.

Original languageEnglish
Article number8515278
Pages (from-to)508-511
Number of pages4
JournalIEEE Transactions on Plasma Science
Volume47
Issue number1
DOIs
StatePublished - Jan 2019

Keywords

  • Arc discharges
  • gas discharge devices
  • plasma devices
  • ultraviolet sources

Fingerprint Dive into the research topics of '550-W Ultraviolet exciplex source for pulsed power applications'. Together they form a unique fingerprint.

  • Cite this