• 968 Citations (Scopus)
  • 14 h-Index
19942019

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Conference article
1999

Characterization of a non-chemically amplified resist for photomask fabrication using a 257 nm optical pattern generator

Rathsack, B. M., Tabery, C. E., Stachowiak, T. B., Dallas, T., Xu, C. B., Pochkowski, M. & Willson, C. G., 1999, In : Proceedings of SPIE - The International Society for Optical Engineering. 3873, pt 1, p. 80-92 13 p.

Research output: Contribution to journalConference article

1 Scopus citations